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1

Intensity Distribution of Transverse Electric Wave Diffracted by a Perfectly Black Half Plane or an Infinite Slit Opened in a Perfectly Black Plane

Saburo NONOGAKI

Journal:

Year:

2006

Language:

english

File:

PDF, 1.16 MB

english, 2006

2

Azide-Containing Phenolic Resin as a Negative Deep Uv Resist

Nonogaki, Saburo, Toriumi, Minoru

Journal:

Journal of Macromolecular Science Part A - Chemistry

Year:

1988

Language:

english

File:

PDF, 445 KB

english, 1988

3

A water-soluble, reciprocity-law-failing photoresist

Motoo Akagi, Saburo Nonogaki, Takahiro Kohashi, Yoichi Oba, Mitsuru Oikawa, Yoshifumi Tomita

Journal:

Polymer Engineering & Science

Year:

1977

Language:

english

File:

PDF, 275 KB

english, 1977

4

Recent resist developments in Japan—a review

Saburo Nonogaki

Journal:

Polymer Engineering & Science

Year:

1983

Language:

english

File:

PDF, 472 KB

english, 1983

5

Azide-phenolic resin UV resist (MRL) for microlithography

Takao Iwayanagi, Michiaki Hashimoto, Saburo Nonogaki, Shigeru Koibuchi, Daisuke Makino

Journal:

Polymer Engineering & Science

Year:

1983

Language:

english

File:

PDF, 491 KB

english, 1983

6

Photochemistry of azide-phenolic resin photoresists

Michiaki Hashimoto, Takao Iwayanagi, Hiroshi Shiraishi, Saburo Nonogaki

Journal:

Polymer Engineering & Science

Year:

1986

Language:

english

File:

PDF, 717 KB

english, 1986

7

Polyvalent Anion-Exchange Resins Composed of Cross-Linked Polyethyleneimine Complexes of Heavy Metals

Nonogaki, Saburo, Makishima, Shoji, Yoneda, Yukio

Journal:

Journal of Physical Chemistry

Year:

1958

Language:

english

File:

PDF, 355 KB

english, 1958

8

Epoxide-Containing Polymers as Highly Sensitive Electron-Beam Resists

Hirai, Takako, Hatano, Yoshio, Nonogaki, Saburo

Journal:

Journal of The Electrochemical Society

Year:

1971

Language:

english

File:

PDF, 601 KB

english, 1971

9

Fine Chromium Grating Directly Made by Irradiating Electron Beam

Maekawa, Akiji, Munakata, Chusuke, Miura, Yoji, Honda, Yukio, Saitou, Norio, Nonogaki, Saburo

Journal:

Japanese Journal of Applied Physics

Year:

1971

Language:

english

File:

PDF, 129 KB

english, 1971

10

PGMA as a High Resolution, High Sensitivity Negative Electron Beam Resist

Taniguchi, Yoshio, Hatano, Yoshio, Shiraishi, Hiroshi, Horigome, Shinkichi, Nonogaki, Saburo, Naraoka, Kiyotake

Journal:

Japanese Journal of Applied Physics

Year:

1979

Language:

english

File:

PDF, 267 KB

english, 1979

11

High-Resolution Proximity Exposure through a Phase Shifter Mask

Nonogaki, Saburo, Imai, Akira

Journal:

Japanese Journal of Applied Physics

Year:

1993

Language:

english

File:

PDF, 238 KB

english, 1993

12

A Rigorous Solution of Two-Dimensional Diffraction Based on the Huygens-Fresnel Principle

Nonogaki, Saburo

Journal:

Japanese Journal of Applied Physics

Year:

1989

File:

PDF, 662 KB

1989

13

SPIE Proceedings [SPIE 1985 Microlithography Conferences - Santa Clara (Monday 11 March 1985)] Advances in Resist Technology and Processing II - Azide-Phenolic Resin Resists Sensitive To Visible Light

Nonogaki, Saburo, Hashimoto, Michiaki, Iwayanagi, Takao, Shiraishi, Hiroshi, Thompson, Larry F.

Year:

1985

Language:

english

File:

PDF, 1.64 MB

english, 1985

14

SPIE Proceedings [SPIE Microlithography Conference - Santa Clara, CA (Monday 2 March 1987)] Advances in Resist Technology and Processing IV - A Novel, Diazonium-Phenolic Resin Two-Layer Resist System Utilizing Photoinduced Interfacial Insolubilization

Uchino, Shou-ichi, Iwayanagi, Takao, Ueno, Takumi, Hashimoto, Michiaki, Nonogaki, Saburo, Bowden, Murrae J.

Year:

1987

Language:

english

File:

PDF, 5.15 MB

english, 1987

15

Photosensitive resist system composed of phenolic resin and aromatic azide

Nonogaki, Saburo, Toriumi, Minoru

Journal:

Makromolekulare Chemie Macromolecular Symposia

Year:

1990

Language:

english

File:

PDF, 320 KB

english, 1990

16

SPIE Proceedings [SPIE 1985 Microlithography Conferences - Santa Clara (Monday 11 March 1985)] Advances in Resist Technology and Processing II - A Series Of Azide-Phenolic Resin Resists For The Range Of Deep UV To Visible Light

Koibuchi, Shigeru, Isobe, Asao, Makino, Daisuke, Iwayanagi, Takao, Hashimoto, Michiaki, Nonogaki, Saburo, Thompson, Larry F.

Year:

1985

Language:

english

File:

PDF, 9.49 MB

english, 1985

17

Photosensitive resist materials.

Nonogaki, Saburo

Journal:

Year:

1984

File:

PDF, 2.24 MB

1984

18

Resolution Capability of Resist

NONOGAKI, Saburo

Journal:

Year:

1995

File:

PDF, 2.11 MB

1995

19

The Photopolymer Science and Technology Award

Nonogaki, Saburo

Journal:

Journal of Photopolymer Science and Technology

Year:

1999

File:

PDF, 1.01 MB

1999

20

Trend of development in resists.

NONOGAKI, SABURO

Journal:

NIPPON GOMU KYOKAISHI

Year:

1985

File:

PDF, 527 KB

1985

21

A new water-soluble photoresist used a polymeric azide compound as a photosensitizer.

Morishita, Hajime, Ito, Masato, Hayashi, Nobuaki, Nonogaki, Saburo, Odaka, Yoshiyuki, Nishizawa, Masahiro

Journal:

Journal of Photopolymer Science and Technology

Year:

1994

Language:

english

File:

PDF, 330 KB

english, 1994

22

Anion-exchanging Water-insoluble Polyamine Complex of Copper

Nonogaki, Saburo, Makishima, Shoji, Yoneda, Yukio

Journal:

The Journal of the Society of Chemical Industry Japan

Year:

1958

File:

PDF, 964 KB

1958

23

Supercomplex Formation by Coordinate Bonds

NONOGAKI, Saburo, YONEDA, Yukio, MAKISHIMA, Shoji

Journal:

Nippon kagaku zassi

Year:

1959

File:

PDF, 548 KB

1959

24

Anion-exchanging Water-insoluble Polyamine Complexes of Cobalt

Nonogaki, Saburo, Makishima, Shoji, Yoneda, Yukio

Journal:

The Journal of the Society of Chemical Industry Japan

Year:

1958

File:

PDF, 1.25 MB

1958

25

Characteristics of Photoconductive Response Velocity of Cadmium Sulfide

Oikawa, Mitsuru, Okabe, Tadao, Nonogaki, Saburo

Journal:

The Journal of the Society of Chemical Industry Japan

Year:

1962

File:

PDF, 1.73 MB

1962